Method of forming fine patterns and manufacturing semiconductor light emitting device using the same

ABSTRACT

A method of forming a fine pattern begins with providing a c-plane hexagonal semiconductor crystal. A mask having a predetermined pattern is formed on the semiconductor crystal. The semiconductor crystal is dry-etched by using the mask to form a first fine pattern on the semiconductor crystal. The semiconductor crystal including the first fine pattern is wet-etched to expand the first fine pattern in a horizontal direction to form a second fine pattern. The second fine pattern obtained in the wet-etching the semiconductor crystal has a bottom surface and a sidewall that have unique crystal planes, respectively. The present fine-pattern forming process can be advantageously applied to a semiconductor light emitting device, particularly, to a phonic crystal structure required to have fine patterns or a structure using a surface plasmon resonance principle.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the priority of Korean Patent Application Nos.2007-98320 filed on Sep. 28, 2007 and 2008-86063 filed on Sep. 1, 2008in the Korean Intellectual Property Office, the disclosure of which isincorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a fine-pattern forming process, andmore particularly, to a process for manufacturing a semiconductor lightemitting device including the fine patterns to improve light efficiency.

2. Description of the Related Art

Various semiconductor devices are being fabricated, such as lightemitting diodes, laser diodes, photodiodes and transistors based onsemiconductors.

For specific functions, the semiconductor device may be required to havefine patterns such as periodic/non-periodic patterns at a predeterminedregion. Such fine patterns may be formed by etching a semiconductorsurface using a known etching process.

In the case of a nitride semiconductor light emitting device,light-extraction efficiency is limited due to a difference in arefractive index between the outside and a nitride semiconductor. Inorder to overcome this limitation, a fine-pattern structure may beformed in a surface of the nitride semiconductor light emitting device.

A photonic crystal structure having fine periodic grating patterns isbeing actively studied in order to improve luminance of a semiconductorlight emitting device. Also, similar fine grating patterns are beingadopted for a method for improving luminance by using a principle ofsurface Plasmon resonance.

However, an etching process used in this patterning process haslimitations in forming fine patterns on a semiconductor surface. Thelimitations vary according to an etching method being used.

For example, dry etching such as reactive ion etching (RIE) andinductively coupled plasma reactive ion etching (ICP-RIE) can secureprecise and reproducible patterns because it allows power control andhas anisotropy. However, the dry etching has limitations in thatproperties of a semiconductor surface easily deteriorate due to aphysical bombardment with ions or neutral atoms during the dry etching.Even if a thin film of a material, which is not p-type GaN, is depositedon a p-type GaN layer and then the thin film is patterned using dryetching, it is difficult to prevent damage to the p-type GaN layerplaced at a portion where the thin film is removed.

A solid line of FIG. 1 represents a current-voltage (I-V) characteristicof a nitride semiconductor light emitting device purposely damaged byICP-RIE using a halogen gas before an electrode is formed on a p-typeGaN surface. A dotted line indicated by ‘X’ represents an I-Vcharacteristic of a nitride semiconductor light emitting device beforethe damage occurs, which is different from an undamaged nitride LEDindicated by ‘♦’. In the nitride semiconductor light emitting devicedamaged by the dry etching, a current begins to flow from a low voltage.However, this current is not the one that is generated by the normalcarrier recombination but a leakage current that generates almost nolight.

Therefore, research is ongoing on a method for recovering an originalstate of a crystal from damage caused by dry etching. However, becauseof nitrogen vacancy, a surface of a p-type GaN layer undergoes a changein its conductivity type into an n-type during an etching process. Forthis reason, using general post-processing cannot contribute torecovering the damaged crystal. The conductivity type conversion becomesa fatal defect in a p-n junction diode.

Unlike the dry etching, wet etching does not cause damage to asemiconductor surface such as p-type GaN. However, the wet etching alsohas limitations in that a specific plane (e.g., a c-plane) of a nitridesingle crystal is not etched almost at all, and precise patterning isdifficult to achieve. Also, if an etching depth is excessive, a top endof a thin film is completely removed, and thus a photoresist layerserving as a mask is separated.

SUMMARY OF THE INVENTION

An aspect of the present invention provides a method of forming finepatterns, which can minimize a damaged area resulting from dry etchingby using a horizontal etching characteristic of a {0001} c-planehexagonal semiconductor crystal after the dry etching.

An aspect of the present invention also provides a method ofmanufacturing a semiconductor light emitting device having finepatterns, which has improved optical output by using the method offorming fine patterns.

According to an aspect of the present invention, there is provided amethod of forming a fine pattern, including: providing a c-planehexagonal semiconductor crystal; forming a mask having a predeterminedpattern on the semiconductor crystal; dry-etching the semiconductorcrystal by using the mask to form a first fine pattern on thesemiconductor crystal; and wet-etching the semiconductor crystalincluding the first fine pattern to expand the first fine pattern in ahorizontal direction to form a second fine pattern. The second finepattern obtained in the wet-etching the semiconductor crystal may have abottom surface and a sidewall that have unique crystal planes,respectively.

The semiconductor crystal substrate may be formed of a p-type nitridesemiconductor that may be damaged by dry etching.

Since a bottom surface, which is a c-plane may not be etched almost atall in the wet etching, a bottom surface obtained in the forming a firstfine pattern may have the same c-plane that a bottom surface obtained inthe forming a second fine pattern has.

The pattern of the mask may include a plurality of line patterns formedin a <11-20> orientation of the semiconductor crystal and arranged alonga <1-100> orientation, and the sidewall of the second fine pattern mayhave an m-plane.

The pattern of the mask may include a plurality of line patterns formedin a <1-100> orientation of the semiconductor crystal and arranged in a<11-20> orientation. In the current embodiment, as the wet etchingfurther proceeds, the line patterns may become uneven at their surfacesand then may be partially thinned and thus provided as dotted patterns.Furthermore, if necessary, even the dotted patterns may be completelyetched and removed by performing additional etching. Consequently, thisetching method may be used as a method for controlling a thickness of asemiconductor layer.

The pattern of the mask may include a plurality of fine holes, and thesecond fine pattern may include a plurality of hexagonal fine holes. Aninner wall of the hole may have a crystal plane that is varied over timeof wet etching, which is a secondary etching process. The forming asecond fine pattern may include performing wet-etching such that thesidewall of the second fine pattern has an m-plane component and ans-plane component. Also, by continuing the wet etching, an innersidewall of the hole may include an r-plane component, which is morestable and can provide a lower coverage.

The second fine pattern may have a pillar structure.

According to needs, the forming a second fine pattern may be performedbefore or after the mask is removed.

According to another aspect of the present invention, there is provideda method of manufacturing a semiconductor light emitting device, whichcan be advantageously applied to a phonic crystal structure required tohave fine patterns or a structure using a surface plasmon resonanceprinciple.

The method of manufacturing a semiconductor light emitting device,includes: providing a multilayered semiconductor structure including afirst conductivity type semiconductor layer, a second conductivity typesemiconductor layer, and an active layer between the first and secondconductivity type semiconductor layers; forming a mask having apredetermined pattern on the second conductivity type semiconductorlayer of the multilayered semiconductor structure; dry-etching thesecond conductivity type semiconductor layer by using the mask to form afirst fine pattern on the second conductivity type semiconductor layer;wet-etching the second conductivity type semiconductor layer includingthe first fine pattern to expand the first fine pattern in a horizontaldirection to form a second fine pattern; and forming a first electrodeand a second electrode in a state where the mask has been removed, thefirst and second electrode respectively being connected with the firstand second conductivity type semiconductor layers. The secondconductivity type semiconductor layer may be a c-plane hexagonalsemiconductor crystal, and the second fine pattern obtained from thewet-etching the second conductivity type semiconductor layer may have abottom surface and a sidewall that have unique crystal planes,respectively.

The second fine pattern formed at the second conductivity typesemiconductor layer may serve as a photonic crystal structure thatimproves light extraction efficiency by attenuating a total reflectioneffect caused by a low refractive index of the ambient air or a sealantwhen light generated at the active layer is extracted to the outsidethrough a surface of the p-type nitride semiconductor layer.

For a preferable phonic crystal structure, a light transmissiveconductive layer may be formed on the second conductivity typesemiconductor layer including the second fine pattern. For example, alight transmissive metal layer or a light transmissive conductive oxidelayer such as ITO may be formed.

To form a structure using a surface plasmon resonance principle, theforming a second electrode may include forming a highly reflective metallayer such as Ag on the second conductivity type semiconductor layerincluding the second fine pattern. The highly reflective metal layer mayhave a multilayered structure.

The second conductivity type semiconductor layer may have a thicknessallowing energy generated by recombination of an electron-hole pairinjected to the active layer to excite a surface plasmon at an interfacebetween the second conductivity type semiconductor layer and the highlyreflectively metal layer.

The second conductivity type semiconductor layer may have a thickness ofabout 50 nm or less between the second fine pattern and the activelayer.

The manufacturing method according to the present invention may beadvantageously applied to a light emitting device including themultilayered semiconductor structure of a nitride semiconductor. In thiscase, the second conductivity type semiconductor layer may be a p-typenitride semiconductor layer.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other aspects, features and other advantages of thepresent invention will be more clearly understood from the followingdetailed description taken in conjunction with the accompanyingdrawings, in which:

FIG. 1 is a graph showing a current-voltage (I-V) curve of a nitridesemiconductor light emitting device including a p-type GaN layer damagedby dry etching;

FIGS. 2A through 2D are cross-sectional views for explaining afine-pattern forming process using horizontal wet etching according toan exemplary embodiment of the present invention;

FIGS. 3A through 3C are scanning electron microscope (SEM) imagesshowing pattern changes over time of horizontal wet etching in afine-pattern forming process according to an exemplary embodiment(embodiment 1A) of the present invention;

FIGS. 4A through 4D are SEM images showing pattern changes over time ofhorizontal wet etching in a fine-pattern forming process according toanother exemplary embodiment (embodiment 1B) of the present invention;

FIG. 5 is an SEM image of a three-dimensional pattern (pillar structure)obtained according to still another exemplary embodiment (embodiment 1C)of the present invention;

FIGS. 6A and 6B are SEM images of fine patterns after dry etching andafter horizontal wet etching, respectively, in a fine-pattern formingprocess according to yet another exemplary embodiment (embodiment 1D) ofthe present invention;

FIGS. 7A an 7B are SEM images showing pattern changes over time ofhorizontal wet etching in a fine-pattern forming process according to afurther exemplary embodiment (embodiment 1E) of the present invention;

FIG. 8A is a cross-sectional view of a nitride semiconductor lightemitting device (application example of a photonic crystal structure)obtained by a manufacturing method according to an exemplary embodimentof the present invention;

FIG. 8B is a plan view of a fine pattern layer taken along line A-A′ ofthe nitride semiconductor light emitting device of FIG. 8A;

FIG. 9 is a graph showing an I-V curve of a nitride semiconductor lightemitting device manufacture by a method of manufacturing a semiconductorlight emitting device according to an exemplary embodiment (embodiment2) of the present invention;

FIG. 10 is a graph showing optical output with respect to the current ofthe nitride semiconductor light emitting device manufactured by themethod of manufacturing a semiconductor light emitting device accordingto the exemplary embodiment (embodiment 2) of the present invention;

FIG. 11 is a cross-sectional view of a nitride semiconductor lightemitting device (application example of a surface plasmon resonancestructure) obtained by a manufacturing method according to anotherexemplary embodiment of the present invention;

FIG. 12 is a graph showing an I-V curve of a nitride semiconductor lightemitting device manufactured by a method of manufacturing asemiconductor light emitting device according to another exemplaryembodiment (embodiment 3) of the present invention; and

FIG. 13 is a graph showing optical output with respect to the current ofthe nitride semiconductor light emitting device manufactured by themethod of manufacturing a semiconductor light emitting device accordingto another exemplary embodiment (embodiment 3) of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

Exemplary embodiments of the present invention will now be described indetail with reference to the accompanying drawings.

FIGS. 2A through 2D are cross-sectional views for explaining afine-pattern forming process using horizontal wet etching according toan exemplary embodiment of the present invention.

As shown in FIG. 2A, the fine-pattern forming process according to thecurrent embodiment begins with providing a c-plane hexagonalsemiconductor crystal 11.

The semiconductor crystal 11 may be a nitride semiconductor such as GaNor another known semiconductor in a hexagonal system. Particularly, thesemiconductor base 11 may be a p-type nitride layer which is susceptibleto damage from dry etching. According to the current embodiment, ahexagonal semiconductor crystal having an upper surface provided as ac-plane {0001} is used.

Thereafter, as shown in FIG. 2B, a mask 18 having predetermined patternsis formed on the semiconductor crystal 11.

The mask 18 may be a photoresist pattern. In this process, the mask 180having desired patterns may be formed by applying photoresist on anupper surface of the semiconductor crystal 11, and then performing ageneral lithography process or a holographic lithography processthereon.

The patterns may be periodic patterns if necessary, but patterns of themask 18 used for the present invention may vary. For example, thepatterns may be periodic patterns such as one-dimensional line patternsand two-dimensional triangular or rectangular grating patterns,quasi-periodic patterns having low short-range periodicity and highlong-range periodicity, or non-periodic patterns.

The size and shape of the patterns may vary even if the periodicity orquasi-periodicity is maintained. This is because anisotropic wet etchingprocess (horizontal direction in the present invention) is performedafter the dry etching using a mask. This will now be described in moredetail with reference to FIGS. 2C and 2D.

A hybrid etching process which is a combination of primary dry etchingand secondary wet etching is used in the current fine-pattern formingprocess.

Referring to FIG. 2C, the semiconductor crystal 11 is dry-etched byusing the mask 18, thereby forming first fine patterns P1. The firstfine pattern P1 is obtained in the current process by dry-etching thesemiconductor crystal 11 up to a width corresponding to a width W1 of anopening of the mask 18 and up to a predetermined depth d1 of thesemiconductor crystal 116. The depth of the first fine pattern P1obtained from the dry etching is almost equal to a depth of a final finepattern P2 of FIG. 2D. However, the width W1 of the first pattern P1 (orthe size of the pattern) is smaller than a width of the final finepattern P2. This will now be described in more detail with reference toFIG. 2D.

As described above, in the current process, ions and neutral atoms usedin the dry etching cause a damaged area D over the entire surface of thefirst fine pattern P1 of the semiconductor crystal 11. That is, an areaD where the crystal is directly exposed by the dry etching and thusdamaged is present not only in a bottom surface but also in a sidewallof the first fine pattern P1. However, this may be minimized by a wetetching process of FIG. 2D.

In a process of FIG. 2D, the semiconductor crystal 11 including thefirst fine patterns P1 is wet-etched. In this embodiment, the wetetching is performed after the mask 18 is removed. However, the presentinvention is not limited thereto, and the mask 18 may be removed afterthe wet etching process.

The wet etching proceeds in a horizontal direction of the first finepattern P1 because it does not affect the stable c-plane almost at all.The horizontal wet etching continues until a sidewall becomes a specificcrystal plane. Since an etch rate is significantly lowered at thespecific crystal plane, the wet etching may be performed with highreproducibility.

The first fine pattern P1 is expanded in its horizontal direction, andthus may become a second fine pattern P1 having a sidewall of a uniquecrystal plane. Consequently, the second fine pattern P2 may have a depthd2 which is equal to the depth d1 of the first fine pattern P1 and awidth W2 which is wider than the width W1 of the first fine pattern P1.

In this process, as shown in FIG. 2D, a damaged area may not begenerated or removed in newly exposed sidewalls and a bottom surfaceobtained by the horizontal expansion of the first fine pattern P1. Thus,a damaged area D′ remains only in an area corresponding to a bottomsurface of the first fine pattern P1.

Thus, the second fine pattern P2 may contribute to minimizing a ratio ofthe damaged area D′ to the entire exposed area. By using this principle,a mask pattern design and a dry etching process may be controlled so asto further lower the ratio of the damaged area.

Specifically, by reducing the width W1 of the mask 18 and increasing thedepth d1 of the first fine pattern P1, a new area obtained by the secondfine pattern P2 can be increased while an area of a damaged bottomsurface corresponding to the first fine pattern P1 is decreased.

Consequently, the ratio of the damaged area D′ with respect to theentire exposed area of the second fine pattern P2 can be significantlyreduced, and thus influences such as deterioration of electricalproperties caused by the damaged area resulting from the dry etching canbe substantially prevented.

According to the present invention, a bottom surface of the first finepattern obtained by the dry etching may be a c-plane which is the sameas the upper surface of the semiconductor crystal. Since the c-plane isa very stable crystal plane, the bottom surface of the first finepattern is not etched almost at all even when the sidewall thereof isbeing wet-etched. Accordingly, it can be seen that the depth of thesecond fine pattern is determined by the depth of the first finepattern, and the depth of the final fine pattern can be preciselycontrolled through the dry etching.

Also, the horizontal wet etching according to the current embodiment ofthe present invention has a very low etch rate when a sidewall exposedby the wet etching becomes a specific crystal plane. For example, in thecase of a nitride single crystal, a sidewall maybe an s-plane {1-101},an m-plane {1-100} or an r-plane {1-102}.

Accordingly, since the wet etching process is a self-terminatingprocess, which stops by itself, it is very advantageous in securingprocess uniformity or high reproducibility.

The crystal orientation of the wet etching as well as mask patternsplays an important role in obtaining the shape and size of the finalpattern in the present invention. The crystal orientation may beselected by a mask pattern formed on a semiconductor crystal to beetched.

That is, since wet etching rates vary according to a crystal plane,various patterns may be obtained according to which crystal plane isexposed at a sidewall of a crystal pattern exposed by a mask pattern(see embodiments 1A and 1B).

Particularly, the present inventor found that a fine pattern of ahexagonal hole can be obtained by forming a rough circular hole by dryetching and then wet-etching it in a horizontal direction. The finepattern has a size of sub-micrometer and may have a hexagonal shapehaving each side forming a sharp angle of 120° with respect to anadjacent side (see embodiment 1C). This may be considered as a uniquecharacteristic of the present invention that no other related artsemiconductor etching methods have been unable to achieve.

Furthermore, as mentioned above, each crystal plane exposed in the formof a hexagon may be different according to wet etching. Particularly,since the crystal plane of the sidewall may be inclined according towet-etching conditions, a sidewall having a coverage facilitatingdeposition of an electrode material may be provided.

Operations and effects of various embodiments of the present inventionwill now be described in more detail.

Embodiment 1A

According to the current embodiment, a mask having line patterns formedin a <11-20> orientation and arranged in a <1-100> orientation is formedon a c-plane GaN semiconductor crystal. A period of the line patterns isset to about 0.6 μm. Thereafter, dry etching is performed up to a depthof about 0.1 μm, and then the mask is removed (see FIG. 3A).

Thereafter, wet etching using a 4M KOH aqueous solution is performed atabout 100° C. for about 10 minutes, then an observation is made using ascanning electron microscope, and then the wet etching is furtherperformed for about 20 minutes (total 30 minutes).

As a result of the wet etching performed for about ten minutes, aninitial sidewall which is somewhat inclined becomes a vertical sidewallas shown in FIG. 3B. Since the sidewall becomes a {1-100} plane, whichis a relatively stable crystal plane of GaN, i.e., an m-plane, thesidewall is no longer etched during the additional wet etching for about20 minutes. Of course, a bottom surface, which is the stable c-plane isalmost not etched.

According to the current embodiment, it can be seen that a damaged arearesulting from the dry etching is removed from the sidewall and aportion of a bottom surface, and a clean crystal plane can be obtained.The crystal plane may secure excellent electrical contact in asemiconductor device.

Embodiment 1B

According to this embodiment, similarly to the embodiment 1A, a maskhaving a plurality of line patterns (period: about 0.6 μm) is formed ona c-plane GaN semiconductor crystal. The difference there is a formationorientation and an arrangement orientation thereof. That is, accordingto the current embodiment, a plurality of line patterns are formed in a<1-100> orientation and arranged in a <11-20> orientation. Thereafter,dry etching is performed up to a depth of about 0.1 μm, and then themask is removed (see FIG. 4A).

Thereafter, wet etching using a 4M KOH aqueous solution is performed ata temperature of about 100° C. for about 10 minutes, and a resultingstructure is observed using an SEM (see FIG. 4B). Thereafter, the wetetching is performed thereon for about 20 minutes (total 30 minutes) anda resulting structure is observed using the SEM (see FIG. 4C).Thereafter, the wet etching is performed additionally for about 20minutes (total 50 minutes) and a resulting structure is observed usingthe SEM (see FIG. 4D).

According to the current embodiment, a pattern resulting from the dryetching (see FIG. 4A) has a similar form to that in the embodiment 1A(see FIG. 3A).

However, as shown in FIG. 4B, as horizontal wet etching proceeds, awidth of the pattern is increased (i.e., a width of a pattern structureis gradually decreased). As the etching process proceeds for about 30minutes or longer, the line patterns becomes dot patterns linearlyarranged as shown in FIG. 4C. As the etching further proceeds, acompletely flat plane remains (see FIG. 4D). This is because thepatterns continuously change over time since the wet etching isperformed at a relatively high etch rate in a <11-20> orientation ascompared another stable crystal plane.

As described above, according to the current embodiment, one-dimensionalgrating and dot patterns may be provided, which vary in length and widthand have relatively small damage.

As seen from the current embodiment (horizontal wet etching of a gratingwith a <1-100> orientation), it is possible to remove the c-plane, whichis typically not wet-etched, to a predetermined thickness. That is,according to the present invention, dry etching is performed on a smallarea to form a groove, and horizontal wet etching is used as asubsequent process. It is also possible to reduce a thickness of anoriginal epitaxial layer to a desired extent by controlling the etchingdepth of the initial dry etching.

Particularly, the surface of a p-type GaN layer cannot be dry-etchedbecause of damage and cannot also be wet-etched because it is thec-plane. However, by using the process according to the currentembodiment, the thickness of the p-type GaN layer can be reduced while adamaged portion thereof is minimized.

Embodiment 1C

Unlike the previous embodiments 1A and 1B, the current embodimentemploys three-dimensional patterns. A plurality of circular maskpatterns each having a size of about 0.3 μm are formed on a c-plane GaNsemiconductor crystal. The plurality of circular mask patterns arearranged vertically and horizontally at a period of about 0.6 μm.

Thereafter, dry etching is performed up to a depth of about 0.1 μm, andthen the mask is removed. Thereafter, wet etching using a 4M KOH aqueoussolution is performed at about 100° C. for about 10 minutes and then aresulting structure is captured by using an SEM. As shown in FIG. 5, itcan be seen that a three-dimension pattern such as a pillar structure(diameter: about 130 nm) is formed.

Embodiment 1D

According to the current embodiment, a three-dimensional pattern isemployed as in the previous embodiment 1C, but a mask having a pluralityof circular holes each having a size of about 100 nm is formed on ac-plane GaN semiconductor crystal. The plurality of circuit holes arearranged vertically and horizontally at a period of about 0.5 μmtherebetween.

Dry etching (about 0.1 μm) is performed on the c-plane GaN surface byusing the mask, thereby forming rough circular hole patterns, and thenthe mask is removed (see FIG. 6A). After the circular hole patterns areformed, wet etching using a 4M KOH aqueous solution is performed atabout 108° C. for about 30 minutes. As shown in FIG. 6B, after finepatterns each having a hexagonal hole having each side parallel to a{1-100} m-plane are formed, the fine patterns are not etched any longer.

Embodiment 1E

The current embodiment is similar to the previous embodiment 1D exceptthat a diameter of each of final holes is made to be greater in order tofacilitate observation of changes in a crystal plane at a sidewall ofthe final hole. In the current embodiment, a period of the holes is thesame as in the previous embodiment 1D, but the diameter of the hole ismade to be greater.

A section of a hexagonal hole resulting from the horizontal wet etching(100° C., 4M KOH aqueous solution) is captured as an SEM image. FIG. 7Aillustrates a result of wet etching for about 10 minutes, and FIG. 7Billustrates a result of etching for 40 minutes.

As a result, as the wet etching proceeds, an area occupied by an s-planewhich is relatively less stable decreases at a sidewall of the hole, andan area occupied by the m-plane increases. In more detail, it can beseen from FIG. 7A that a portion where the m-plane meets the c-planewhich is a bottom surface is the s-plane but it is gradually changed tothe r-plane and then the c-plane as the etching proceeds.

As a result of observing a section of a hexagonal hole over time of wetetching, it can be seen that as the wet etching proceeds, the shape ofthe sidewall resulting from the initial dry etching is changed until thestable crystal plane is gradually exposed. Particularly, the crystalplane of the inner sidewall of the hole may be constituted by acombination of the {0001} c-plane which is the bottom surface and the{1-101} s-plane, the {1-100} m-plane, the {1-102} r-plane or the like.Since the wet etching does not proceed in the c-plane direction, thedepth of the hole does not change. However, it may be assumed that ifthe bottom surface has fine unevenness and inclination, they can beremoved because of the horizontal etching operation.

As described above, as for the fine patterns obtained according to thepresent invention, crystal planes exposed by the horizontal etching areclean planes obtained by removing a portion damaged by the dry etching.Thus, when an electric contact layer is formed at the crystal plane, anexcellent ohmic characteristic can be secured. Also, when an electrodematerial is deposited, a contact characteristic can be improved byadjusting a degree of slope of the crystal plane according to thecrystal plane.

The fine-pattern forming process may be widely applied in forming afunctional pattern of various semiconductor devices. Particularly, itmay be advantageously applied to forming a pattern for improving lightefficiency of a semiconductor light emitting device. An embodiment ofFIG. 8A is associated with a nitride semiconductor light emitting device80 which is an application example of a photonic crystal.

Referring to FIG. 8A, a nitride semiconductor light emitting device 80includes a sapphire substrate 81, and an n-type nitride semiconductorlayer 82, an active layer 84 and a p-type nitride semiconductor layer 85sequentially formed on the sapphire substrate 81.

Also, the nitride semiconductor light emitting device 80 includes ann-side electrode 89 a and a p-side electrode 89 b. The n-side electrode89 a and the p-side electrode 89 b are electrically connected to then-type nitride semiconductor layer 82 and the p-type nitridesemiconductor layer 85, respectively.

Periodic fine patterns P3 are formed on the p-type nitride semiconductorlayer 85. The fine patterns P3 may be obtained through the processdescribed with reference to FIGS. 2A through 2D (embodiment 1D). Thatis, as shown in FIG. 8B, hexagonal holes may be periodically arranged.

According to the current embodiment, as shown in FIGS. 8A and 8B, alight-transmissive conductive layer 87 is further formed on the p-typenitride semiconductor layer 85 including the periodic fine hole patternsP3. The light-transmissive conductive layer 87 may be formed of anymaterial that has a light-transmissive property while securing ohmiccontact. For example, a light-transmissive metal layer such as Ni/Au ora light-transmissive conductive oxide layer such as ITO may be used.

Also, a thickness ts of the p-type nitride semiconductor layer 85 may be50 nm or less. If the thickness ts of the p-type nitride semiconductorlayer 85 is excessively small, i.e., if the distance from the activelayer 84 to a grating structure is excessively short, the leakagecurrent drastically increases. For this reason, the thickness ts of thep-type nitride semiconductor layer 85 may be 10 nm or more.

The fine patterns P3 formed at the p-type nitride semiconductor layer 85may serve as a photonic crystal structure that improves light extractionefficiency by attenuating a total reflection effect caused by a lowrefractive index of the ambient air or a sealant when light generated atthe active layer 84 is extracted to the outside through a surface of thep-type nitride semiconductor layer 85.

The fine-pattern forming process according to the present invention maybe implemented with high precision and excellent reproducibility becauseof an etch rate varying according a crystal plane even when wet etchingis used. Accordingly, the fine-pattern forming process can beadvantageously applied to the nitride semiconductor light emittingdevice having a photonic crystal structure illustrated in FIG. 8A.

Although the nitride semiconductor light emitting device is described inthe current embodiment, the present invention is not limited thereto andmay be applied to light emitting devices employing various knownsemiconductor materials.

Also, the embodiment of FIG. 8A uses a photonic crystal structure on aspecific semiconductor layer such as a p-type nitride semiconductorlayer. However, the embodiment of FIG. 8A may be advantageously appliedto a method for forming periodic fine patterns employed for a surfacePlasmon or a method for forming desired fine patterns while protecting acrystal surface even when non-periodic uneven patterns for lightextraction are formed of different materials.

An embodiment 2 is associated with an experiment on a light emittingdevice having a photonic crystal and a result thereof.

Embodiment 2

According to the current embodiment, a nitride semiconductor lightemitting device having an active layer including an InGaN multi-quantumwell having a green wavelength is manufactured.

As for the light emitting device manufactured according to the currentembodiment, a p-type GaN layer having a thickness of about 150 nm isdry-etched to a thickness of about 54 nm by using a mask having circularholes under similar conditions to those in the embodiment 1D, and thenwet etching is performed thereon for about 10 minutes to form hexagonalhole patterns. Thereafter, similarly to the structure illustrated inFIG. 8A, a light-transmissive electrode oxide such as ITO is depositedon the p-type GaN layer as a light-transmissive electrode layer to forma p-side contact. Mesa-etching is performed thereon to partially exposean n-type GaN layer, and an n-side contact is formed on the exposedn-type GaN layer.

In order to confirm improvement of electrical characteristics andluminance of a semiconductor light emitting device manufactured by amethod according to the present invention, electrical characteristicsand luminance of a nitride semiconductor light emitting device accordingto the embodiment 2 were measured. The results of the measuring areillustrated in FIGS. 9 and 10 in comparison with a reference exampleRef. The reference example Ref is a result of a light emitting device inwhich only an Ag contact is disposed on a p-type nitride semiconductorlayer and no patterns are formed thereon.

FIG. 9 is a graph showing an I-V curve of a nitride semiconductor lightemitting device according to the current embodiment. FIG. 10 is a graphshowing optical output with respect to the current of the nitridesemiconductor light emitting device according to the current embodiment.

As shown in FIG. 9, the nitride semiconductor light emitting devicemanufactured according to the embodiment 2 of the present invention has,unlike the nitride light emitting device of FIG. 1, an I-Vcharacteristic where almost no leakage current is caused by a damagedcrystal resulting from the dry etching. In comparison with the referenceexample Ref, the nitride semiconductor light emitting device has ahigher voltage at the same current, but this difference isinsignificant. An area ratio of a crystal plane obtained from the wetetching may be further increased, so that contact resistance can beimproved and better electrical characteristics can be achieved ascompared to the current embodiment.

FIG. 10 is a graph showing optical output with respect to the current ofa nitride semiconductor light emitting device manufactured according tothe current embodiment of the present invention.

As shown in FIG. 10, it can be seen that compared to the referenceexample Ref, the nitride semiconductor light emitting device accordingto the current embodiment achieves a luminance increase by about 24% at350 mA because of a diffraction effect of a photonic crystal. That is, aphotonic crystal pattern manufactured through an etching processaccording to the present invention is formed with a precise profile suchthat a portion of light confined by total reflection in an LED chip isdiffracted to travel at an angle allowing emission to the outside of thechip. This can also significantly improve the luminance of the LED.

FIG. 11 is a side sectional view of a nitride semiconductor lightemitting device obtained by a manufacturing method of the presentinvention, which is an application example of a resonance principle of asurface plasmon.

A surface plasmon used in this application is a collective chargedensity oscillation of electrons occurring at a surface of a metal thinfilm. A surface plasmon wave generated by the collective charge densityoscillation is a surface electromagnetic wave propagating along aboundary surface between a metal and a dielectric. When coupling occursbetween the surface plasmon and an active layer, spontaneous emissionoccurring at the active layer is increased by the surface plasmon, and alarge portion of light generated by the spontaneous emission is excitedto generate the surface plasmon. A semiconductor light emitting deviceadopting this principle to improve efficiency thereof may be called asurface plasmon semiconductor light emitting device.

Referring to FIG. 11, a surface plasmon nitride semiconductor lightemitting device 110 is mounted on a submount substrate 120 by soldering.The surface plasmon nitride semiconductor light emitting device 110includes a nitride semiconductor sapphire substrate 111, and an n-typenitride semiconductor layer 112, an active layer 114 and a p-typenitride semiconductor layer 115 sequentially disposed on the nitridesemiconductor sapphire substrate 111.

Also, the nitride semiconductor light emitting device 110 includes ann-side electrode 117 and a p-side electrode 118 respectivelyelectrically connected to the n-type nitride semiconductor layer 112 andthe p-type nitride semiconductor layer 115.

Fine patterns P4 having periodicity are formed on the p-type nitridesemiconductor layer 115. These fine patterns P4 may be hexagonal holepatterns arranged periodically, which are obtained by the process(embodiment 1D) explained with reference to FIGS. 2A through 2D.

According to the current embodiment, as shown in FIG. 11, ahighly-reflective metal layer is formed as the p-side electrode 118 onthe p-type nitride semiconductor layer 115 including the periodic finehole patterns P4. The highly reflective metal layer may be formed of amaterial that has a predetermined reflectance while securing ohmiccontact. For example, the highly reflective metal layer may be formed ofa mono- or multilayered metal material such as Al, Ag, Au, Cr, Ni, Pdand Pt.

Also, a distance between the active layer 114 and the highly reflectivemetal layer is very important in causing surface plasmon resonance.Accordingly, the p-type nitride semiconductor layer 115 is required tohave a sufficient thickness to allow light emitted from the active layer114 to excite the surface plasmon at an interface between the p-typenitride semiconductor layer 115 and the highly reflectively metal layer.

The thickness ts of the p-type nitride semiconductor layer 115 may beless than about 50 nm. If the thickness ts of the p-type nitridesemiconductor layer 115 is not sufficient, i.e., the distance from theactive layer 114 to a grating structure is excessively short, a drasticincrease in leakage current occurs. For this reason, the p-type nitridesemiconductor layer 115 may have a thickness ts of 10 nm or greater.

According to the current embodiment, the surface Plasmon resonance maybe employed for a light emitting device to improve light emissionefficiency.

In this configuration, fine patterns P4 having a periodic gratingstructure are necessary at an interface between the p-type nitridesemiconductor layer 115 and the highly reflective metal layer in orderto reconvert the excited surface Plasmon into light. Particularly, aprecise interval and size of the fine patterns P4 are determined basedon a wavelength generated from the active layer 114.

In this regard, dry etching is preferable. However, as describedpreviously, the distance between the active layer 114 and the highlyreflective metal layer is very important among various conditions forcausing the surface plasmon resonance, such as a wavelength of incidentlight and a refractive index of a material contacting metal. Because thedistance is generally 50 nm or less, which is relatively short, damageto the p-type nitride semiconductor layer 115 caused by the dry etchingmay cause serious limitations. However, the fine-pattern forming processaccording to the present invention can minimize a damaged portionremaining in the fine patterns P4 at the final stage. Also, even if wetetching is used, the fine-pattern forming process according to thepresent invention can achieve high precision and excellentreproducibility because of an etch rate varying according to the crystalplane. Accordingly, the fine-pattern forming process according to thepresent invention may be advantageously applied to the surface plasmonnitride semiconductor light emitting device illustrated in FIG. 11.

Embodiment 3

According to the current embodiment, similarly to the embodiment 2, anitride semiconductor light emitting device having an active layer of anInGaN multi-quantum well with a green wavelength is manufactured.

The LED manufactured according to the current embodiment includeshexagonal hole patterns formed by performing dry etching to a depth ofabout 33 nm using a mask having circular holes on a p-type GaN layerwith a thickness of about 66 nm under similar conditions to those of theembodiment 1D and then performing wet etching for about 10 minutes.Thereafter, similarly to a structure illustrated in FIG. 11, a p-sidecontact is formed by depositing a multilayered metal electrode includinga highly reflective material layer, which is an Ag layer on the p-typeGaN layer, and an n-side contact is formed on an n-type GaN layer byperforming mesa etching to partially expose the n-type GaN layer.

In order to check improvement of electrical characteristics andluminance of the nitride semiconductor light emitting devicemanufactured according to a method of the present invention, improvementof the electrical characteristics and luminance of the nitridesemiconductor light emitting device obtained according to the embodiment3 were measured. The results of the measuring are shown in FIGS. 12 and13 in comparison with a reference example Ref. Here, the referenceexample is a result of a light emitting device structure which includesa multilayered metal electrode which is identical to that of theembodiment 3, without including patterns on a p-type nitridesemiconductor layer.

FIG. 12 is a graph showing an I-V curve of the nitride semiconductorlight emitting device according to the current embodiment. FIG. 13 is agraph showing optical output with respect to the current of the nitridesemiconductor light emitting device according to the current embodiment.

It can be seen from FIG. 12 that, as seen from FIG. 1, the nitridesemiconductor light emitting device manufactured according to theembodiment 3 of the present invention has an I-V characteristic in whichalmost no leakage current is generated at the time of dry etching.However, somewhat irregular curves are observed on the I-V curve of thecurrent embodiment that has a very thin p-type nitride semiconductorlayer as compared to a general nitride semiconductor light emittingdevice.

In comparison with the reference example Ref, the nitride semiconductorlight emitting device according to the current embodiment has almostconstant voltage at the same current. Better electrical characteristicsthan those in the current embodiment may be expected by increasing anarea ratio of the crystal plane obtained from the wet etching and thusimproving contact resistance.

FIG. 13 is a graph showing optical output with respect to the current ofa nitride semiconductor light emitting device according to theembodiment 3 of the present invention.

It can be seen from FIG. 13 that as compared to the reference exampleRef, the nitride semiconductor light emitting device according to thecurrent embodiment has luminance improved by about 64% at a current of350 mA because of the surface plasmon resonance effect. That is, thefine grating structure manufactured using an etching process accordingto the present invention is formed with a precise profile, so thatenergy of an electron-hole pair injected to a multi-quantum well withinan LED chip is converted into light through the medium of the surfaceplasmon, and the light is emitted to the outside of the LED chip.

Also, a portion of light generated by self-emission without using thesurface plasmon as the medium and confined by total reflection isdiffracted to convert a propagation direction of the light to an angleallowing emission of the light to the outside of the chip. Thus,luminance of the light emitting device can also be significantlyimproved.

According to the present invention, only a minimum portion of a desiredpattern area is dry-etched and then wet-etching is performed in ahorizontal direction to form a structure, so that damage caused in thedry etching can be minimized. Also, a crystal orientation (patternforming direction) and wet-etching conditions (conditions such as time)are properly controlled, so that high reproducibility of fine patternscan be secured while the height and the size of fine patterns are freelycontrolled. A semiconductor light emitting device with excellent lightefficiency can be provided by applying such fine patterns to a photoniccrystal structure or a structure employing a surface plasmon principle.

Also, a specific geometric shape of the fine patterns according to thepresent invention is formed naturally according to the hexagonal crystalsystem during the subsequent wet etching process. Thus, the finepatterns have unique crystal planes such as the c-plane, the m-plane,the s-plan and/or the r-plane where almost no damage occurs. Since thecrystal plane may directly contact an electrode layer of metal orconductive oxide in the semiconductor light emitting device, it is moreadvantageous in forming a p-type ohmic contact.

While the present invention has been shown and described in connectionwith the exemplary embodiments, it will be apparent to those skilled inthe art that modifications and variations can be made without departingfrom the spirit and scope of the invention as defined by the appendedclaims.

1. A method of forming a fine pattern, the method comprising: providinga c-plane hexagonal semiconductor crystal; forming a mask having apredetermined pattern on the semiconductor crystal; dry-etching thesemiconductor crystal by using the mask to form a first fine pattern onthe semiconductor crystal; and wet-etching the semiconductor crystalincluding the first fine pattern to form a second fine pattern byexpanding the wet-etching from an inside sidewall of the first finepattern in a horizontal direction, wherein the second fine patternobtained in the wet-etching the semiconductor crystal has a bottomsurface and a sidewall that have unique crystal planes, respectively. 2.The method of claim 1, wherein the semiconductor crystal substrate isformed of a p-type nitride semiconductor.
 3. The method of claim 1,wherein a bottom surface obtained in the forming a first fine patternhas the same c-plane that a bottom surface obtained in the forming asecond fine pattern has.
 4. The method of claim 3, wherein the patternof the mask comprises a plurality of line patterns formed in a <11-20>orientation of the semiconductor crystal and arranged along a <1-100>orientation, and the sidewall of the second fine pattern has an m-plane.5. The method of claim 3, wherein the pattern of the mask comprises aplurality of line patterns formed in a <1-100> orientation of thesemiconductor crystal and arranged in a <11-20> orientation.
 6. Themethod of claim 3, wherein the pattern of the mask comprises a pluralityof fine holes, and the second fine pattern comprises a plurality ofhexagonal fine holes.
 7. A method of forming a fine pattern, the methodcomprising: providing a c-plane hexagonal semiconductor crystal; forminga mask having a predetermined pattern on the semiconductor crystal;dry-etching the semiconductor crystal by using the mask to form a firstfine pattern on the semiconductor crystal; and wet-etching thesemiconductor crystal including the first fine pattern from an insidesidewall to expand the first fine pattern in a horizontal direction toform a second pattern, wherein the second fine pattern obtained in thewet-etching the semiconductor crystal has a bottom surface and asidewall that have unique crystal planes, respectively, wherein theforming a second fine pattern comprises performing wet-etching such thatthe sidewall of the second fine pattern has an m-plane component and ans-plane component.
 8. The method of claim 6, wherein the forming asecond fine pattern comprises performing wet-etching such that thesidewall of the second fine pattern includes an r-plane component. 9.The method of claim 3, wherein the second fine pattern has a pillarstructure.
 10. The method of claim 1, wherein the forming a second finepattern is performed after the mask is removed.
 11. The method of claim1, wherein the forming a second fine pattern is performed before themask is removed.
 12. A method of manufacturing a semiconductor lightemitting device, the method comprising: providing a multilayeredsemiconductor structure including a first conductivity typesemiconductor layer, a second conductivity type semiconductor layer, andan active layer between the first and second conductivity typesemiconductor layers; forming a mask having a predetermined pattern onthe second conductivity type semiconductor layer of the multilayeredsemiconductor structure; dry-etching the second conductivity typesemiconductor layer by using the mask to form a first fine pattern onthe second conductivity type semiconductor layer; wet-etching the secondconductivity type semiconductor layer including the first fine patternto form a second fine pattern by expanding the wet-etching from aninside sidewall of the first fine pattern in a horizontal direction; andforming a first electrode and a second electrode in a state where themask has been removed, the first and second electrode respectively beingconnected with the first and second conductivity type semiconductorlayers, wherein the second conductivity type semiconductor layer is ac-plane hexagonal semiconductor crystal, and the second fine patternobtained from the wet-etching the second conductivity type semiconductorlayer has a bottom surface and a sidewall that have unique crystalplanes, respectively.
 13. The method of claim 12, wherein the forming asecond electrode comprises forming a transparent electrode layer on thesecond conductivity type semiconductor layer including the second finepattern.
 14. The method of claim 12, wherein the forming a secondelectrode comprises forming a highly reflective metal layer on thesecond conductivity type semiconductor layer including the second finepattern.
 15. The method of claim 14, wherein the second conductivitytype semiconductor layer has a thickness allowing light emitted at theactive layer to excite a surface plasmon at an interface between thesecond conductivity type semiconductor layer and the highly reflectivelymetal layer.
 16. The method of claim 14, wherein the second conductivitytype semiconductor layer has a thickness of about 50 nm or less.
 17. Themethod of claim 12, wherein the multilayered semiconductor structure isformed of a nitride semiconductor, and the first conductivity typesemiconductor layer and the second conductivity type semiconductor layerare an n-type nitride semiconductor layer and a p-type nitridesemiconductor layer, respectively.
 18. The method of claim 17, wherein abottom surface obtained in the forming a first fine pattern has the samec-plane that the bottom surface obtained in the forming a second finepattern has.
 19. The method of claim 18, wherein the pattern of the maskcomprises a plurality of line patterns formed in a <11-20> orientationof the semiconductor crystal and arranged along a <1-100> orientation,and the sidewall of the second fine pattern has an m-plane.
 20. Themethod of claim 18, wherein the pattern of the mask comprises aplurality of line patterns formed in a <1-100> orientation of thesemiconductor crystal and arranged along a <11-20> orientation.
 21. Themethod of claim 18, wherein the pattern of the mask comprises aplurality of fine holes, and the second fine pattern comprises aplurality of fine hexagonal holes.
 22. A method of forming a finepattern, the method comprising: providing a c-plane hexagonalsemiconductor crystal; forming a mask having a predetermined pattern onthe semiconductor crystal; dry-etching the semiconductor crystal byusing the mask to form a first fine pattern on the semiconductorcrystal; and wet-etching the semiconductor crystal including the firstfine pattern from an inside sidewall to expand the first fine pattern ina horizontal direction to form a second pattern, wherein the second finepattern obtained in the wet-etching the semiconductor crystal has abottom surface and a sidewall that have unique crystal planes,respectively, wherein the forming a second fine pattern comprisesperforming wet-etching such that the sidewall of the second fine patternhas an m-plane component and an s-plane component.
 23. The method ofclaim 21, wherein the forming a second fine pattern comprises performingwet-etching such that the sidewall of the second fine pattern has anr-plane component.
 24. The method of claim 13, wherein the second finepattern has a pillar structure.
 25. The method of claim 13, wherein themask is removed between the forming a first fine pattern and the forminga second fine pattern.
 26. The method of claim 13, wherein the mask isremoved after the forming a second fine pattern.